The dispersions of the refractive index and absorption coefficient were determined for monolayers of titanium oxide and silicon oxide. The design of a multilayer antireflective optical coating for these materials in the spectral range of 0.4–8 μm has been developed. Modes for applying coating using ion-beam sp-uttering onto a semiconductor substrate have been selected. The optical characteristics of a four-layer interference coating with antireflection coating on a ZGP substrate were measured in the range of 2097 nm and 3.5–5 μm, with residual reflection R ≤ 0.2% and R ≤ 2.1%, respectively. Tests were carried out for adhesion and abrasion of the coating in accordance with GOST.